Location History:
- Lebanon, NH (US) (2010 - 2019)
- Etna, NH (US) (2015 - 2020)
Company Filing History:
Years Active: 2010-2020
Title: Innovations by Wayne Chin
Introduction
Wayne Chin is an accomplished inventor based in Etna, New Hampshire, known for his contributions to the field of plasma cutting technology. With a total of four patents to his name, Chin has made significant advancements that enhance the efficiency and effectiveness of thermal processing tools.
Latest Patents
One of Wayne Chin's latest patents is titled "Systems and methods for providing power for plasma arc cutting." This innovative plasma cutting system features a plasma torch equipped with a head and housing. The power supply, located within the housing, communicates with the plasma torch and is designed to provide the necessary output current for generating and maintaining a plasma cutting arc. The system includes a control processor that interacts with multiple autonomous switching circuits through a multi-node communications bus. Each switching circuit is equipped with a microcontroller that manages the output current based on messages from the control processor, monitors operational parameters, and adjusts control parameters independently when certain thresholds are exceeded.
Another notable patent is "Optimization and control of material processing using a thermal processing torch." This invention introduces a consumable component for a thermal processing torch, which includes a body and a signal device. The signal device transmits information related to the consumable component, independent of any detectable physical characteristics.
Career Highlights
Wayne Chin is currently employed at Hypertherm, Inc., a company renowned for its cutting and welding technologies. His work at Hypertherm has allowed him to apply his innovative ideas in practical applications, contributing to the company's reputation as a leader in the industry.
Collaborations
Throughout his career, Wayne Chin has collaborated with notable colleagues, including Richard Eugene Anderson and Girish R Kamath. These partnerships have fostered a creative environment that encourages the development of groundbreaking technologies.
Conclusion
Wayne Chin's contributions to plasma cutting technology exemplify the spirit of innovation in the field of thermal processing. His patents reflect a commitment to enhancing operational efficiency and effectiveness in industrial applications.