Longmont, CO, United States of America

Wayne A Overby


Average Co-Inventor Count = 2.0

ph-index = 3

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 1986-1990

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3 patents (USPTO):Explore Patents

Title: Wayne A Overby: Innovator in Laser Technology

Introduction

Wayne A Overby is a notable inventor based in Longmont, Colorado. He has made significant contributions to the field of laser technology, particularly in the development of electronic schemes for improving the performance of multiple beam laser scanning systems. With a total of 3 patents, Overby has demonstrated his expertise and innovative spirit in the realm of electrophotographic machines.

Latest Patents

One of Overby's latest patents is titled "Pel placement correction in the scan dimension of a multiple beam laser." This invention addresses the challenges of mechanical misalignment and electrical delays in laser beam scanning systems. The electronic scheme he developed allows for the precise adjustment of the positions at which laser beams are activated, ensuring optimal performance in electrophotographic applications. Another significant patent is "Chromatic and misalignment compensation in a multiple beam laser." This invention corrects mechanical misalignment and chromatic aberrations, enhancing the accuracy of laser scanning. By utilizing reference and non-reference laser beams, Overby’s system achieves high precision in pel placement, maintaining accuracy within desired tolerances.

Career Highlights

Wayne A Overby is currently employed at International Business Machines Corporation (IBM), where he continues to innovate and contribute to advancements in laser technology. His work has had a lasting impact on the efficiency and effectiveness of electrophotographic machines.

Collaborations

Overby has collaborated with notable colleagues such as Russell Alan Budd and Bruce David Gibson. Their combined expertise has fostered an environment of innovation and creativity in their projects.

Conclusion

Wayne A Overby is a distinguished inventor whose work in laser technology has led to significant advancements in electrophotographic systems. His patents reflect a commitment to improving the precision and performance of laser scanning technologies.

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