Wayne A Branagh

Title: Wayne A. Branagh: Innovator in Semiconductor Technology

Introduction

Wayne A. Branagh is a notable inventor based in Omaha, NE, who has made significant contributions to the field of semiconductor technology. With a focus on improving the efficiency and accuracy of semiconductor circuit fabrication, Branagh's work has implications for various applications in the electronics industry.

Latest Patents

Branagh holds a patent for a "Method and system for identifying etch end points in semiconductor circuit fabrication." This innovative patent discloses a spectrometer system with unique wavelength resolution that enhances the relative positioning of the diffraction grating and detector. Additionally, it introduces a modified evolving windowed factor analysis-based method for detecting semiconductor etch end points, which is particularly well-suited for real-time monitoring and process control. The use of wavelength group selecting mask filters is also a key feature of this patent.

Career Highlights

Branagh's career is marked by his dedication to advancing semiconductor technology. He has worked at Sd Acquisition Inc., where he has been able to apply his expertise in developing cutting-edge solutions for the semiconductor industry. His innovative approach has positioned him as a valuable asset in his field.

Collaborations

Throughout his career, Branagh has collaborated with talented individuals such as Robert C. Fry and Juan C. Ivaldi. These collaborations have fostered an environment of innovation and have contributed to the successful development of new technologies.

Conclusion

Wayne A. Branagh's contributions to semiconductor technology through his patent and work at Sd Acquisition Inc. highlight his role as an influential inventor in the industry. His innovative methods for identifying etch end points are paving the way for advancements in semiconductor fabrication processes.