Chiayi, Taiwan

Way-Chih Hsu


Average Co-Inventor Count = 10.3

ph-index = 1


Company Filing History:


Years Active: 2023

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2 patents (USPTO):

Title: Way-Chih Hsu: Innovator in Oligomer Technology

Introduction

Way-Chih Hsu is a notable inventor based in Chiayi, Taiwan. He has made significant contributions to the field of oligomer technology, particularly focusing on the development of advanced materials with enhanced properties. His work has led to the filing of multiple patents, showcasing his innovative approach to solving complex problems in material science.

Latest Patents

Way-Chih Hsu holds 2 patents that highlight his expertise in oligomer technology. His latest patents include the development of an oligomer (2,6-dimethylphenylene ether) along with its fabrication method and cured product. This invention features a structure that comprises independently functioning hydrogen, alkyl or phenyl groups, and various functional groups, resulting in products with high glass-transition temperatures, low dielectric properties, preferred thermal stability, and excellent flame retardancy. Additionally, he has developed a phosphinated (2,6-dimethylphenyl ether) oligomer, which includes a unique structure that enhances its organic solubility and overall performance.

Career Highlights

Way-Chih Hsu is currently associated with Cpc Corporation, Taiwan, where he continues to innovate and develop new materials. His work has been instrumental in advancing the understanding and application of oligomers in various industries. His contributions have not only enriched the field but have also paved the way for future innovations.

Collaborations

Way-Chih Hsu has collaborated with esteemed colleagues such as Sheng-De Li and Ching-Hsuan Lin. These partnerships have fostered a collaborative environment that encourages the exchange of ideas and the development of groundbreaking technologies.

Conclusion

Way-Chih Hsu is a prominent figure in the field of oligomer technology, with a focus on creating materials that exhibit superior properties. His innovative patents and collaborations reflect his commitment to advancing material science. His work continues to inspire future innovations in the industry.

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