Company Filing History:
Years Active: 1986-1990
Title: Wataru Ishii: Innovator in Photosensitive Materials
Introduction
Wataru Ishii is a prominent inventor based in Hadano, Japan. He has made significant contributions to the field of photosensitive materials, holding a total of 5 patents. His work focuses on developing innovative compositions that enhance the performance of photolithographic processes, particularly in semiconductor manufacturing.
Latest Patents
Ishii's latest patents include an undercoating material for photosensitive resins. This undercoating composition is designed to provide a robust layer for a top coat of a photosensitive resist layer on a substrate surface. The principal ingredient is a condensation product derived from the reaction between a hydroxy-substituted diphenylamine and a melamine compound. This innovative undercoating is highly resistant to the overcoating solution, significantly improving the fidelity of pattern reproduction in photolithography. Additionally, his negative-working photosensitive composition is suitable for photoresist materials in semiconductor processing. It comprises a condensation product of a hydroxy-substituted diphenylamine and an azide compound that absorbs UV light, resulting in a photoresist layer with high resistance to heat and gas plasma.
Career Highlights
Wataru Ishii is associated with Tokyo Ohka Kogyo Co., Ltd., a company known for its advancements in chemical products for the semiconductor industry. His work has been instrumental in enhancing the efficiency and reliability of photolithographic techniques.
Collaborations
Ishii has collaborated with notable coworkers such as Hisashi Nakane and Akira Yokota, contributing to the development of innovative materials and processes in the semiconductor field.
Conclusion
Wataru Ishii's contributions to the field of photosensitive materials have made a significant impact on semiconductor manufacturing. His innovative patents and collaborations continue to advance the technology in this critical area.
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