Ama-gun, Japan

Wataru Iida

This inventor holds 1 USPTO granted patent. Top assignee: Toyota Jidosha Kabushiki Kaisha. Active years: 2009.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wataru Iida. Retrieved from https://idiyas.com/inventor/wataru-iida-eyvmuc3u

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2009

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1 patent (USPTO):Explore Patents

Title: Wataru Iida: Innovator in Laser Technology

Introduction

Wataru Iida is a notable inventor based in Ama-gun, Japan. He has made significant contributions to the field of laser technology, particularly with his innovative designs that enhance production efficiency.

Latest Patents

Wataru Iida holds a patent for a laser beam machine. This machine is designed for processing articles using a laser beam from a processing scanner. It features an optical system that employs a laser oscillator. The article position controllers are coordinated to ensure that the surface of the article being processed remains nearly perpendicular to the direction of the laser beam. This design allows for simultaneous processing and loading of articles, thereby reducing wait times and improving production efficiency. He has 1 patent to his name.

Career Highlights

Wataru Iida is currently employed at Toyota Jidosha Kabushiki Kaisha, a leading automotive manufacturer. His work focuses on integrating advanced laser technologies into manufacturing processes, which has been pivotal in enhancing operational efficiency.

Collaborations

Wataru collaborates with talented coworkers, including Hironari Mikata and Kazuhisa Mikame. Their combined expertise contributes to the innovative projects at Toyota.

Conclusion

Wataru Iida's contributions to laser technology exemplify the impact of innovation in manufacturing. His work not only advances the field but also sets a benchmark for future developments in production efficiency.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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