Tokyo, Japan

Wataru Ichise

This inventor holds 2 USPTO granted patents. Top assignee: Tokyo Shibaura Electric Co., Ltd.. Active years: 1978-1980.


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 2

Forward Citations = 8(Granted Patents)


Company Filing History:


Years Active: 1978-1980

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2 patents (USPTO):Explore Patents

Title: Wataru Ichise: Innovator in Getter Materials

Introduction

Wataru Ichise is a notable inventor based in Tokyo, Japan. He has made significant contributions to the field of materials science, particularly in the development of innovative getter materials used in cathode ray tubes. With a total of 2 patents, Ichise's work has had a considerable impact on the technology industry.

Latest Patents

Ichise's latest patents include a nitrogen-emitting composition designed for use with flash getter materials. This composition comprises iron, germanium, and nitrogen, and is specifically adapted to produce a getter film that is deposited on the inner walls of cathode ray tubes. Another significant patent is a mercury emitting structure featuring an annular receptacle with a groove at the upper end. This structure is filled with a face-centered cubic lattice type intermetallic compound primarily consisting of yttrium, nickel, and mercury.

Career Highlights

Wataru Ichise is currently associated with Tokyo Shibaura Electric Co., Ltd., where he continues to innovate and develop new technologies. His work has been instrumental in advancing the capabilities of cathode ray tube technology, which has applications in various electronic devices.

Collaborations

Ichise has collaborated with notable coworkers such as Hideharu Nihei and Kenji Enokida. Their combined expertise has contributed to the successful development of advanced materials and technologies.

Conclusion

Wataru Ichise is a prominent inventor whose work in getter materials has paved the way for advancements in electronic technology. His innovative patents and collaborations highlight his significant contributions to the field.

Profile summary based on public USPTO records.
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