Wataru Hasegawa

Title: Wataru Hasegawa: Innovator in Microwave Deposition Technology

Introduction

Wataru Hasegawa is a notable inventor based in Higashiosaka, Japan. He has made significant contributions to the field of thin film deposition technology. His innovative approach has led to advancements that enhance the efficiency and effectiveness of material application processes.

Latest Patents

Hasegawa holds a patent for an "Apparatus for the simultaneous microwave deposition of thin films." This invention focuses on the simultaneous plasma-assisted chemical vapor deposition of thin film material onto an elongated web of substrate material at multiple discrete spatially separated deposition zones. The design allows the substrate to travel in a serpentine path through a reduced pressure enclosure. By utilizing an elongated linear applicator as a source of microwave energy, Hasegawa's apparatus achieves a high rate of uniform deposition without exceeding the melting point of the substrate. The preferred embodiment involves a low-temperature, microwave transmissive synthetic plastic resin, which serves as a barrier coating to prevent oxygen diffusion.

Career Highlights

Hasegawa's career is marked by his dedication to advancing deposition technologies. His work at Energy Conversion Devices, Inc. has positioned him as a key player in the field. His innovative solutions have garnered attention and respect within the industry.

Collaborations

Hasegawa has collaborated with notable colleagues, including Masatsugu Izu and Buddie R Dotter, II. These partnerships have contributed to the development and refinement of his patented technologies.

Conclusion

Wataru Hasegawa's contributions to microwave deposition technology exemplify his innovative spirit and commitment to advancing material application processes. His patent reflects a significant step forward in the field, showcasing the potential for enhanced efficiency in thin film deposition.