Higashiomi, Japan

Wataru Fujita

This inventor holds 2 USPTO granted patents and 1 published patent application. Top assignee: Kyocera Corporation. Active years: 2025-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wataru Fujita. Retrieved from https://idiyas.com/inventor/wataru-fujita

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 2 

% Patents Active = 50.0

Average Co-Inventor Count = 1.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2025-2026

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2 patents (USPTO):Explore Patents

Title: Wataru Fujita: Innovator in Electrostatic Chuck Technology

Introduction

Wataru Fujita is a notable inventor based in Higashiomi, Japan. He has made significant contributions to the field of electrostatic technology, particularly through his innovative designs and patents. His work is recognized for its practical applications in various industries.

Latest Patents

Wataru Fujita holds a patent for an electrostatic chuck. This invention includes a plate-shaped body with an adsorption surface for mounting a workpiece, a base, and an electrode film located between the plate-shaped body and the base. Notably, both the plate-shaped body and the base are made of sapphire, and the angle between the adsorption surface and the c-plane of the sapphire is 45° or more. This design enhances the efficiency and effectiveness of the electrostatic chuck in various applications. He has 1 patent to his name.

Career Highlights

Fujita is associated with Kyocera Corporation, a leading company in advanced ceramics and electronics. His role at Kyocera has allowed him to contribute to cutting-edge technologies and innovations in the field. His expertise in electrostatic technology has positioned him as a valuable asset to the company.

Conclusion

Wataru Fujita's contributions to electrostatic chuck technology exemplify his innovative spirit and dedication to advancing engineering solutions. His work continues to influence the industry and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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