Shanghai, China

Warda Gul

This inventor holds 1 USPTO granted patent and 2 published patent applications. Top assignee: Delta Electronics (Shanghai) Co., Ltd.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Warda Gul. Retrieved from https://idiyas.com/inventor/warda-gul

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 1 

% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Warda Gul: Innovator in Magnetic Assembly Technology

Introduction

Warda Gul is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of magnetic assembly technology. His innovative work has led to the development of a unique power module that showcases his expertise and creativity.

Latest Patents

Warda Gul holds a patent for a magnetic assembly and power module. This invention provides a magnetic assembly that includes a magnetic core with a first magnetic leg and a second magnetic leg, which are spatially separated to define a spatial channel. The winding assembly consists of three windings, with specific arrangements around the magnetic legs. This design enhances the efficiency and functionality of the power module.

Career Highlights

Warda Gul has established himself as a key figure in the technology sector. He works at Delta Electronics (Shanghai) Co., Ltd., where he continues to innovate and develop advanced technologies. His work has garnered attention for its practical applications and potential impact on the industry.

Collaborations

Warda collaborates with talented coworkers, including Haijun Yang and Tianding Hong. Their combined expertise contributes to the success of their projects and the advancement of technology at their company.

Conclusion

Warda Gul is a remarkable inventor whose work in magnetic assembly technology is paving the way for future innovations. His contributions are significant in the field, and his patent reflects his dedication to advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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