Pittsburgh, PA, United States of America

Wanwen Chen

This inventor holds 1 USPTO granted patent. Top assignee: Carnegie Mellon University. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wanwen Chen. Retrieved from https://idiyas.com/inventor/wanwen-chen

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 1.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Wanwen Chen and Needle-Tracking Innovation.

Introduction

Wanwen Chen is an inventor associated with Carnegie Mellon University in Pittsburgh, Pennsylvania. His patent work addresses the challenge of tracking a curved needle as it is inserted into a subject, an important task in image-guided procedures.

Latest Patents

Chen is associated with 1 patent, titled “System and Method for Tracking a Curved Needle.” The invention describes a system, method, and computer program product that track a needle across a sequence of images. The method first assesses the needle’s visibility. When visibility meets a specified threshold, it detects the needle’s location using an algorithm that accounts for the needle’s curvature. When visibility falls below the threshold, it uses a different algorithm to detect the location. It then tracks the needle through the image sequence using the locations identified by both approaches.

Career Highlights

The patent highlights Chen’s work on image-based needle tracking. By adapting its detection approach to the needle’s visibility, the system is designed to maintain tracking across changing image conditions.

Collaborations

Chen’s association with Carnegie Mellon University connects this invention to the university’s research environment. The provided information does not identify specific co-inventors or other collaborators.

Conclusion

Wanwen Chen’s patent presents an adaptive approach to tracking curved needles in image sequences, combining visibility assessment, curvature-aware detection, and location tracking.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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