Cheongju, South Korea

Wanuk Kim

This inventor holds 1 USPTO granted patent. Top assignee: Olas Co., Ltd.. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wanuk Kim. Retrieved from https://idiyas.com/inventor/wanuk-kim

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: The Innovations of Wanuk Kim

Introduction

Wanuk Kim is a notable inventor based in Cheongju, South Korea. He has made significant contributions to the field of materials science, particularly in the development of anti-reflective coatings. His work is characterized by a focus on enhancing the performance of optical materials.

Latest Patents

Wanuk Kim holds a patent for an anti-reflective hardmask composition. This innovative composition includes a polymer composed of an indolocarbazole and an organic solvent. The patent aims to improve the efficiency and effectiveness of hardmask materials used in various applications.

Career Highlights

Wanuk Kim is associated with Olas Co., Ltd., where he continues to push the boundaries of material innovation. His expertise in polymer chemistry and optical materials has positioned him as a key figure in his field. He has successfully developed solutions that address industry challenges.

Collaborations

Wanuk Kim collaborates with Sang Jun Choi, leveraging their combined expertise to advance their research and development efforts. Their partnership has led to innovative solutions that benefit their company and the broader industry.

Conclusion

Wanuk Kim's contributions to the field of materials science, particularly through his patent for an anti-reflective hardmask composition, highlight his innovative spirit and dedication to advancing technology. His work continues to influence the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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