Longtan, Taiwan

Wang-Tsae Gu

This inventor holds 1 USPTO granted patent. Top assignee: Chung-Shan Institute of Science and Technology. Active years: 2011.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wang-Tsae Gu. Retrieved from https://idiyas.com/inventor/wang-tsae-gu-16rnvqlh

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1


Company Filing History:


Years Active: 2011

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1 patent (USPTO):Explore Patents

Title: Wang-Tsae Gu: Innovator in Epoxy Resin Technology

Introduction

Wang-Tsae Gu is a notable inventor based in Longtan, Taiwan. He has made significant contributions to the field of epoxy resin technology. His innovative work has led to the development of a unique epoxy resin that incorporates side-chain-tethered caged POSS.

Latest Patents

Wang-Tsae Gu holds a patent for an "Epoxy resin containing side-chain-tethered caged POSS and preparation method thereof as well as epoxy resin material containing POSS-epoxy and preparation method thereof." This patent describes a preparation method for an epoxy resin that includes tethering a POSS group to the side chain of diglycidyl ether of bisphenol A (DGEBA) epoxy resin. The process involves reacting the epoxy resin with caged POSS to create a new material that is evenly distributed within the epoxy resin.

Career Highlights

Wang-Tsae Gu is affiliated with the Chung-Shan Institute of Science and Technology, Armaments Bureau, M.N.D. His work at this institution has allowed him to focus on advanced materials and their applications in various fields.

Collaborations

Wang-Tsae Gu has collaborated with notable colleagues, including Cheng-Chien Yang and Chen-Chi Martin Ma. These partnerships have contributed to the advancement of his research and innovations.

Conclusion

Wang-Tsae Gu's contributions to epoxy resin technology exemplify the impact of innovative thinking in material science. His patent reflects a significant advancement in the field, showcasing the potential for new applications in various industries.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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