Company Filing History:
1 out of 54 
1 out of 54 Years Active: 2021
Title: Wang Hai Ying: Innovator in Semiconductor Technology
Introduction
Wang Hai Ying is a prominent inventor based in Shanghai, China. He has made significant contributions to the field of semiconductor technology, particularly through his innovative patent. His work focuses on enhancing the performance and reliability of semiconductor structures.
Latest Patents
Wang Hai Ying holds a patent for a semiconductor structure and a method for forming the same. This patent describes a method that includes providing a substrate with a discrete first gate laminated structure. It also involves forming a unit dielectric layer and an isolation spacer layer, which optimizes the electrical performance of the semiconductor structure. The method aims to prevent the formation of a protruded sharp portion in the metal silicide layer, thereby increasing the breakdown voltage of a unit memory area.
Career Highlights
Throughout his career, Wang has worked with notable companies in the semiconductor industry. He has been associated with Semiconductor Manufacturing International Corporation in Shanghai and Semiconductor Manufacturing International Corporation in Beijing. His experience in these organizations has contributed to his expertise in semiconductor technology.
Collaborations
Wang has collaborated with various professionals in his field, including his coworker Han Liang. These collaborations have further enriched his work and innovations in semiconductor structures.
Conclusion
Wang Hai Ying is a key figure in the semiconductor industry, with a focus on innovative solutions that enhance electrical performance. His contributions through patents and collaborations continue to impact the field positively.