Wan-Soo Park

Title: The Innovative Contributions of Wan-Soo Park

Introduction

Wan-Soo Park is a notable inventor based in Suwon-si, South Korea. He has made significant contributions to the field of wiring structures in electronics. His work is particularly recognized for its innovative methods that enhance the efficiency and reliability of electronic components.

Latest Patents

Wan-Soo Park holds a patent for "Methods of forming wiring structures including a plurality of metal layers." This patent describes a method of forming a wiring structure where a lower structure is created on a substrate. An insulating interlayer is then formed on this lower structure. The insulating interlayer is partially removed to create at least one via hole and a dummy via hole. Subsequently, an upper portion of the insulating interlayer is partially removed to form a trench that connects the via hole and the dummy via hole. A first metal layer is then formed to fill both the via hole and the dummy via hole, followed by a second metal layer that fills the trench on top of the first metal layer. This innovative approach is crucial for advancing wiring technologies in electronic devices.

Career Highlights

Wan-Soo Park is currently employed at Samsung Electronics Co., Ltd., a leading company in the technology sector. His work at Samsung has allowed him to contribute to cutting-edge developments in electronics. With a total of 1 patent, he has established himself as a valuable asset in the field of innovation.

Collaborations

Some of Wan-Soo Park's coworkers include Jong-Jin Lee and Rak-Hwan Kim. Their collaborative efforts contribute to the innovative environment at Samsung Electronics, fostering advancements in technology.

Conclusion

Wan-Soo Park's contributions to the field of wiring structures are noteworthy and reflect his dedication to innovation. His patent demonstrates a significant advancement in electronic component design, showcasing his expertise and commitment to the industry.