Hong Kong, China

Wan San Victor Ma

This inventor holds 1 USPTO granted patent. Top assignee: City University of Hong Kong. Active years: 2022.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wan San Victor Ma. Retrieved from https://idiyas.com/inventor/wan-san-victor-ma

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.0

ph-index = 1


Company Filing History:


Years Active: 2022

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1 patent (USPTO):Explore Patents

Title: Wan San Victor Ma: Innovator in Image Processing Technology

Introduction

Wan San Victor Ma is a notable inventor based in Hong Kong, CN. He has made significant contributions to the field of image processing, particularly through his innovative patent. His work focuses on enhancing the quality and utility of images in various applications.

Latest Patents

Wan San Victor Ma holds a patent for a "System and method for generating a stained image." This invention involves a systematic approach to obtaining a first image of a key sample section and processing it with a stain learning engine. The result is at least one stained image that accurately represents the key sample section stained with at least one stain. This technology has the potential to improve image analysis in various scientific and medical fields.

Career Highlights

Wan San Victor Ma is affiliated with the City University of Hong Kong, where he contributes to research and development in image processing technologies. His academic background and professional experience have equipped him with the skills necessary to innovate in this specialized area.

Collaborations

Wan San Victor Ma has worked alongside his coworker, Yixuan Yuan, to advance their research initiatives. Their collaboration has fostered a productive environment for innovation and development in their respective fields.

Conclusion

Wan San Victor Ma exemplifies the spirit of innovation in image processing technology. His contributions, particularly through his patent, highlight the importance of advancements in this area. His work continues to influence the field and pave the way for future developments.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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