Shenzhen, China

Wan-Chun Zhao

This inventor holds 1 USPTO granted patent. Top assignees: Fih (Hong Kong) Limited, Shenzhen Futaihong Precision Industry Co., Ltd.. Active years: 2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Wan-Chun Zhao. Retrieved from https://idiyas.com/inventor/wan-chun-zhao

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 2010

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1 patent (USPTO):Explore Patents

Title: Wan-Chun Zhao: Innovator in Anti-Fake Identification Technology

Introduction

Wan-Chun Zhao is a notable inventor based in Shenzhen, China. He has made significant contributions to the field of anti-fake identification technology. His innovative approach has led to the development of a unique device aimed at enhancing security and authenticity.

Latest Patents

Wan-Chun Zhao holds a patent for an "Anti-fake identification device and method for making the same." This invention includes a light-emitting layer and a pattern layer. The light-emitting layer incorporates a ultraviolet radiation photo initiator. The pattern layer features several through holes that form a specific pattern. Under ultraviolet radiation, the light-emitting layer emits light, which passes through the pattern layer to reveal the intended design.

Career Highlights

Throughout his career, Wan-Chun Zhao has worked with prominent companies such as Fih (Hong Kong) Limited and Shenzhen Futaihong Precision Industry Co., Ltd. His experience in these organizations has contributed to his expertise in developing innovative technologies.

Collaborations

Wan-Chun Zhao has collaborated with several professionals in his field, including Wei Li and Zhang-Geng Huang. These partnerships have fostered a creative environment that encourages the exchange of ideas and advancements in technology.

Conclusion

Wan-Chun Zhao's contributions to anti-fake identification technology demonstrate his commitment to innovation and security. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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