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For the Inventor, By the Inventor

Almelo, Netherlands

Walterus A Van Egeraat

This inventor holds 3 USPTO granted patents. Top assignee: U.S. Philips Corporation. Active years: 1991-1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walterus A Van Egeraat. Retrieved from https://idiyas.com/inventor/walterus-a-van-egeraat

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 3

% Patents Active = 100.0

Average Co-Inventor Count = 1.3

ph-index = 2

Forward Citations = 7(Granted Patents)


Company Filing History:

goldMedal3 out of 14,087 
 
U.S. Philips Corporation
 patents

Years Active: 1991-1999

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3 patents (USPTO):Explore Patents
1. 5914997 - X-ray spectrometer with an analyzer crystal having a partly variable and (1999-06-22),
2. 5438613 - X-ray analysis apparatus and scanning unit suitable for use in such an (1995-08-01),
3. 5008910 - X-ray analysis apparatus comprising a saggitally curved analysis crystal (1991-04-16),

Title: Walterus A Van Egeraat: Innovator in X-ray Technology

Introduction

Walterus A Van Egeraat is a notable inventor based in Almelo, Netherlands. He has made significant contributions to the field of X-ray technology, holding a total of 3 patents. His work focuses on enhancing the capabilities of X-ray spectrometers and analysis apparatus.

Latest Patents

Among his latest patents, Van Egeraat has developed an X-ray spectrometer featuring an analyzer crystal with a partly variable radius of curvature. This innovative design allows for improved focusing of the X-ray beam emanating from the specimen being analyzed. Additionally, he has created an imaging optical system that utilizes Rowland geometry, which can be effectively employed in spectrometers for X-ray fluorescence. His inventions address the challenges of maintaining adequate intensity in the X-ray detector while preventing the fracturing of the crystal.

Career Highlights

Walterus A Van Egeraat is associated with U.S. Philips Corporation, where he has contributed to advancements in X-ray analysis technology. His work has been instrumental in developing systems that enhance the precision and efficiency of X-ray detection and analysis.

Collaborations

Some of his notable coworkers include Wilhelmus A Gijzen and Johannes P Van Alen, who have collaborated with him on various projects within the field.

Conclusion

Walterus A Van Egeraat's innovative contributions to X-ray technology have significantly impacted the field, showcasing his expertise and dedication to advancing scientific research. His patents reflect a commitment to improving analytical techniques and enhancing the capabilities of X-ray systems.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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