West Caldwell, NJ, United States of America

Walter W Stottmeister

This inventor holds 1 USPTO granted patent. Top assignee: Harcros Chemicals, Inc.. Active years: 1996.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter W Stottmeister. Retrieved from https://idiyas.com/inventor/walter-w-stottmeister

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 2.0

ph-index = 1

Forward Citations = 3(Granted Patents)


Company Filing History:


Years Active: 1996

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1 patent (USPTO):Explore Patents

Title: Walter W. Stottmeister: Innovator in Liquid Epoxy Adhesives

Walter W. Stottmeister is a notable inventor based in West Caldwell, NJ (US). He has made significant contributions to the field of adhesive technology, particularly with his innovative patent in liquid epoxy adhesives.

Latest Patents

Walter holds a patent for a liquid epoxy adhesive composition that features a stable elastomeric phase. This high-strength curable resin composition consists of an epoxy compound with an oxirane group and an elastomer grafted polyol that is covalently linked to the epoxy compound, excluding the oxirane group. His inventive approach enhances the performance and durability of adhesive applications.

Career Highlights

Walter W. Stottmeister is associated with Harcros Chemicals, Inc., where he applies his expertise in adhesive formulations. His work has contributed to advancements in the chemical industry, particularly in developing high-performance adhesive solutions.

Collaborations

Walter has collaborated with Pinakin M. Patel, furthering the research and development of innovative adhesive technologies.

Conclusion

Walter W. Stottmeister's contributions to liquid epoxy adhesives exemplify the impact of innovation in the chemical industry. His patent and work at Harcros Chemicals, Inc. highlight the importance of advancements in adhesive technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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