Hennef, Germany

Walter Schonherr

This inventor holds 1 USPTO granted patent. Top assignee: Arplas Gesellschaft Fur Plasmatechnologie Mbh. Active years: 1999.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter Schonherr. Retrieved from https://idiyas.com/inventor/walter-schonherr-rc1dngrk

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

% Patents Active = 100.0

Average Co-Inventor Count = 3.0

ph-index = 1


Company Filing History:


Years Active: 1999

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1 patent (USPTO):Explore Patents

Title: Walter Schonherr: Innovator in Plasma Technology

Introduction

Walter Schonherr is a notable inventor based in Hennef/Sieg, Germany. He has made significant contributions to the field of plasma technology, particularly through his innovative designs and patents. His work has been instrumental in advancing the applications of plasma units in various industries.

Latest Patents

Walter Schonherr holds a patent for a plasma unit, which showcases his expertise and commitment to innovation. This patent reflects his ability to develop cutting-edge technology that meets the needs of modern applications.

Career Highlights

Walter Schonherr is associated with Arplas Gesellschaft für Plasmatechnologie mbH, where he has played a crucial role in the development of plasma technologies. His work at Arplas has positioned the company as a leader in the field, contributing to advancements that benefit various sectors.

Collaborations

Walter has collaborated with talented individuals such as Steffen Berger and Johannes Messelhauser. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Walter Schonherr's contributions to plasma technology and his patent for a plasma unit highlight his role as an influential inventor. His work continues to inspire advancements in the field, making a lasting impact on technology and industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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