Hamburg, Germany

Walter Kulcke

This inventor holds 1 USPTO granted patent. Top assignee: Technische Universität Hamburg-Harburg. Active years: 2004.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter Kulcke. Retrieved from https://idiyas.com/inventor/walter-kulcke-79ucx2sc

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


Average Co-Inventor Count = 5.0

ph-index = 1

Forward Citations = 4(Granted Patents)


Company Filing History:


Years Active: 2004

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1 patent (USPTO):Explore Patents

Title: Walter Kulcke: Innovator in High-Pressure Gas Separation

Introduction

Walter Kulcke is a notable inventor based in Hamburg, Germany. He has made significant contributions to the field of gas separation technology. His innovative approach focuses on utilizing advanced materials for efficient separation processes.

Latest Patents

Walter Kulcke holds a patent for a method of high-pressure gas separation. This method involves the separation of supercritical gas from substances dissolved in the gas using a specialized membrane. The membrane utilized in this process is a pore-free polymer made of perfluoro-2,2-dimethyl-1,3-dioxole. This innovative technique enhances the efficiency of gas separation, making it a valuable advancement in the field.

Career Highlights

Walter Kulcke is affiliated with the Technische Universität Hamburg-Harburg. His work at this esteemed institution has allowed him to explore and develop cutting-edge technologies in gas separation. His research has garnered attention for its practical applications and potential impact on various industries.

Collaborations

Walter Kulcke has collaborated with notable colleagues, including Klaus-Victor Peinemann and Michael Schossig. These partnerships have contributed to the advancement of research in gas separation technologies.

Conclusion

Walter Kulcke's innovative work in high-pressure gas separation exemplifies the importance of research and development in advancing technology. His contributions continue to influence the field and inspire future innovations.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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