Los Alamos, NM, United States of America

Walter H Reichelt

This inventor holds 1 USPTO granted patent. Top assignee: The United States of America as Represented by the United States. Active years: 1980.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Walter H Reichelt. Retrieved from https://idiyas.com/inventor/walter-h-reichelt

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 22(Granted Patents)


Company Filing History:


Years Active: 1980

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1 patent (USPTO):Explore Patents

Title: Walter H. Reichelt: Innovator in Laser Technology

Introduction

Walter H. Reichelt is a notable inventor based in Los Alamos, NM (US). He has made significant contributions to the field of laser technology, particularly through his innovative patent that enhances laser amplification.

Latest Patents

Reichelt holds a patent for an "Efficient laser amplifier using sequential pulses of different." This invention involves a laser oscillator output pulse that is separated into multiple beams. These beams are then individually amplified by a power amplifier, either temporally or spatially. The amplified beams can be recombined to produce a more powerful output than traditional single beam amplification methods.

Career Highlights

Walter H. Reichelt has worked with the United States of America as represented by the United States. His work has been instrumental in advancing laser technology, showcasing his expertise and innovative spirit.

Collaborations

Reichelt has collaborated with notable individuals in his field, including Wallace T. Leland and John F. Kephart. These collaborations have contributed to the development of cutting-edge technologies in laser amplification.

Conclusion

Walter H. Reichelt's contributions to laser technology through his innovative patent demonstrate his significant impact on the field. His work continues to influence advancements in laser amplification techniques.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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