This inventor holds 1 USPTO granted patent. Top assignee: General Electric Company. Active years: 1977.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1977
Title: Walter C. Balchunas: Innovator in Fused Silica Coating Technology
Introduction
Walter C. Balchunas is a notable inventor based in Linfield, PA (US). He has made significant contributions to the field of materials science, particularly in the application of fused silica coatings. His innovative approach has led to advancements in the way coatings are applied to refractory non-metallic materials.
Latest Patents
Walter C. Balchunas holds a patent for a method of applying a fused silica coating to a substrate. This patent discloses a technique that utilizes high-temperature arc plasma from an arc plasma spray gun, which is projected onto the substrate surface. The process involves feeding particles of crystalline silica into the plasma, where they are melted and entrained. The gun is positioned close enough to the substrate to melt the surface, allowing the molten drops of silica to effectively adhere to the material.
Career Highlights
Walter has had a distinguished career at General Electric Company, where he has applied his expertise in materials science. His work has not only contributed to the company's innovations but has also paved the way for new applications in various industries. His dedication to research and development has made him a valuable asset to his team.
Collaborations
Throughout his career, Walter has collaborated with several talented individuals, including Cecil Bailey and John E. Zlupko. These collaborations have fostered an environment of innovation and have led to the successful development of new technologies.
Conclusion
Walter C. Balchunas is a prominent figure in the field of fused silica coating technology. His innovative methods and dedication to his work have made a lasting impact on materials science. His contributions continue to influence advancements in the industry.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
