This inventor holds 1 USPTO granted patent. Top assignee: Deutschetelekom Ag. Active years: 2001.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 2001
Title: Walter Betz: Innovator in Nanometer Scale Manufacturing
Introduction
Walter Betz is a notable inventor based in Seeheim-Jugenheim, Germany. He has made significant contributions to the field of nanotechnology, particularly in the manufacturing of calibrated scales for high-resolution imaging devices. His innovative approach has paved the way for advancements in various technical applications.
Latest Patents
Walter Betz holds a patent for a "Method for manufacturing a calibrated scale in the nanometer range for technical devices used for the high resolution or ultrahigh-resolution imaging of structures." This patent describes a method for creating and calibrating a scale that is essential for devices used in high-resolution imaging. The process involves using at least two different crystalline or amorphous materials that can be easily distinguished by their contrast when imaged. These materials are deposited as a heterolayer sequence onto a substrate material, and the resulting structure is analyzed to ensure precision in layer thickness. The scale is particularly useful for calibrating devices such as scanning electron microscopy and atomic force microscopy.
Career Highlights
Walter Betz is associated with Deutsche Telekom AG, where he applies his expertise in nanotechnology. His work has been instrumental in enhancing the capabilities of imaging technologies, contributing to the advancement of scientific research and industrial applications.
Collaborations
Walter has collaborated with notable colleagues, including Rainer Loesch and Hartmut Hillmer. Their combined efforts have led to significant advancements in the field of nanotechnology and imaging.
Conclusion
Walter Betz is a distinguished inventor whose work in nanometer scale manufacturing has had a profound impact on high-resolution imaging technologies. His innovative methods and collaborations continue to influence the field, showcasing the importance of precision in scientific advancements.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
