Wai-Shun Chan

Title: Innovations by Wai-Shun Chan in Hair Removal Technology

Introduction

Wai-Shun Chan is an accomplished inventor based in Hackensack, NJ (US). He has made significant contributions to the field of hair removal technology, holding two patents that showcase his innovative approach to this common cosmetic concern.

Latest Patents

Wai-Shun Chan's latest patents focus on a method and composition for hair removal. The invention provides a comprehensive method for removing hair from a selected skin area. The process involves applying a liposome composition containing a photosensitizer to the skin area, allowing it to penetrate hair follicle ducts. The photosensitizer is present in an effective amount to undergo a reaction that damages hair follicles when exposed to light of a specific wavelength, energy, and duration. After applying the composition, the next step is to remove any liposome composition that has not entered the hair follicle ducts. Finally, light is applied to the skin area to activate the photosensitizer, leading to the desired hair removal effect. This innovative method not only enhances the efficiency of hair removal but also provides a new composition useful for this purpose.

Career Highlights

Wai-Shun Chan is currently associated with the New York Blood Center, Inc., where he continues to apply his expertise in innovative technologies. His work has contributed to advancements in cosmetic procedures, particularly in the realm of hair removal.

Collaborations

Wai-Shun Chan has collaborated with notable colleagues, including Ehud Ben-Hur and Maria M Zuk. These partnerships have likely enriched his research and development efforts, leading to more effective solutions in his field.

Conclusion

Wai-Shun Chan's contributions to hair removal technology through his innovative patents reflect his dedication to improving cosmetic procedures. His work continues to influence the industry and offers promising advancements for consumers seeking effective hair removal solutions.