Wai-Ming Yeung

Title: Innovations of Wai-Ming Yeung

Introduction

Wai-Ming Yeung is a notable inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of cleaning process monitoring, holding a total of 2 patents. His work focuses on enhancing the efficiency and effectiveness of cleaning systems.

Latest Patents

Wai-Ming Yeung's latest patents include a method and apparatus for cleaning process monitoring. This innovative system comprises a cleaning container with an inlet for receiving a cleaning solution and an outlet for draining a waste solution. It features a particle detector coupled to the outlet, which measures various particle parameters associated with the waste solution, providing real-time monitoring of the cleaning process. Additionally, a pump is integrated into the cleaning container to create suction force, drawing the solution through the cleaning system. A controller is connected to both the pump and the particle detector, receiving particle parameters and controlling the cleaning system. Finally, a host computer is linked to the controller, supplying at least one control parameter to optimize the cleaning process.

Career Highlights

Wai-Ming Yeung is currently employed at Taiwan Semiconductor Manufacturing Company Limited, where he continues to innovate and develop advanced cleaning technologies. His expertise in this area has positioned him as a key figure in the industry.

Collaborations

Wai-Ming has collaborated with notable coworkers, including Charlie Wang and Yu-Ping Tseng, contributing to various projects and advancements in cleaning technology.

Conclusion

Wai-Ming Yeung's contributions to cleaning process monitoring demonstrate his commitment to innovation and excellence in his field. His patents reflect a deep understanding of the complexities involved in cleaning systems, making him a valuable asset to the industry.