Company Filing History:
Years Active: 2019
Title: **Innovative Contributions of Wagner Chang in Semiconductor Cleaning Technologies**
Introduction
Wagner Chang, an inventive mind based in Huwei, Taiwan, has made significant strides in the field of semiconductor cleaning technologies. With a patented innovation addressing critical challenges in the semiconductor industry, his work reflects the intersection of creativity and technology.
Latest Patents
Wagner Chang holds a patent for a groundbreaking invention titled "Single wafer cleaning tool with HSO recycling". This innovation focuses on methods and apparatus designed to mitigate high metal concentrations found in photoresist residue and facilitate the recycling of sulfuric acid (HSO) in single wafer cleaning processes. The patent outlines a sophisticated cleaning tool that features a processing chamber for a semiconductor substrate. A high oxidative treatment unit is employed to apply a pre-treatment that effectively removes photoresist residues laden with metal impurities. Following this, a sulfuric-peroxide mixture (SPM) cleaning solution is utilized to wash away any remaining contaminants. Notably, the SPM effluent is routed to a recycling unit, which recovers sulfuric acid and reintroduces it to the cleaning unit through a feedback conduit, showcasing an efficient and eco-friendly approach to semiconductor cleaning.
Career Highlights
Wagner Chang's commitment to innovation is reflected in his role at Taiwan Semiconductor Manufacturing Company Limited, where he collaborates on cutting-edge projects. His dedication to improving semiconductor cleaning processes not only positions him as a notable inventor but also enhances the operational efficacy of semiconductor manufacturing.
Collaborations
Wagner collaborates with talented professionals, including his coworkers Chien-Wen Hsiao and Shao-Yen Ku. These partnerships play a crucial role in driving innovation and expanding the horizons of semiconductor technology, reinforcing the importance of teamwork in achieving groundbreaking results.
Conclusion
In conclusion, Wagner Chang's contributions to semiconductor cleaning technologies exemplify how innovative thinking can address complex challenges in the industry. His patented invention not only highlights his inventiveness but also underscores the importance of sustainable practices in semiconductor manufacturing. As technologies evolve, the achievements of inventors like Wagner Chang will continue to pave the way for advancements in this vital field.