Galil, Israel

Wael Salalha


Average Co-Inventor Count = 4.8

ph-index = 1

Forward Citations = 4(Granted Patents)


Location History:

  • Bet Jan, IL (2011)
  • Bet Jan galil, IL (2013)
  • Galil, IL (2015)

Company Filing History:


Years Active: 2011-2015

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3 patents (USPTO):Explore Patents

Title: Wael Salalha: Innovator in Fluid Dynamics and Imaging Technology

Introduction

Wael Salalha is a notable inventor based in Galil, Israel. He has made significant contributions to the fields of fluid dynamics and imaging technology, holding a total of 3 patents. His innovative work has been recognized in various industries, particularly in the development of advanced imaging systems.

Latest Patents

One of Salalha's latest patents is for vortex flow resistors. These devices are designed to efficiently deliver liquid from an upper chamber to a lower chamber before the liquid is distributed onto a cylinder. This innovation enhances the control and efficiency of fluid delivery systems. Another significant patent involves an image forming apparatus that includes sponge applicator units. This method focuses on maintaining a photoconductive member by applying fluid to form an image, transferring the fluid, and utilizing sponge applicator units to clean and cool the photoconductive member.

Career Highlights

Throughout his career, Wael Salalha has worked with prominent companies such as Hewlett-Packard Development Company, L.P. and Hewlett-Packard Indigo B.V. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in imaging and fluid dynamics.

Collaborations

Salalha has collaborated with talented individuals in his field, including Sharon Nagler and Giries Kadis. These partnerships have fostered innovation and have been instrumental in the development of his patented technologies.

Conclusion

Wael Salalha's contributions to fluid dynamics and imaging technology exemplify his innovative spirit and dedication to advancing these fields. His patents reflect a commitment to improving efficiency and functionality in technology.

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