Hewlett-packard Development Company, L.p.

Hewlett-packard Indigo B.v.

Wael Salalha

Sharon Nagler

Giries Kadis

Marko Richter

Shunit Petachia

Ziv Gilan

Roy Har-Tsvi

Shahar Nuriel

Doron Avramov

Assaf Bendek

Vortex flow resisters () deliver liquid from an upper chamber () to a lower chamber () prior to the liquid being distributed onto a cylinder ().

Vortex flow resisters

A method of maintaining a photoconductive member of an image forming apparatus is disclosed. The method includes applying fluid to a photoconductive member to form an image thereon, transferring the fluid from the photoconductive member in the form of the image and providing sponge applicator fluid to respective sponge applicator units. The method also includes squeezing the sponge applicator units to remove at least a portion of the sponge applicator fluid therefrom and sequentially placing each one of the sponge applicator units in contact with the photoconductive member to cool and clean the photoconductive member.

Image forming apparatus including sponge applicator units to sequentially contact a photoconductive member

Hard image forming apparatuses and methods are described. According to one arrangement, a hard image forming apparatus includes an imaging member comprising a surface, a development system configured to provide a marking agent to the surface of the imaging member to form developed images upon the surface of the imaging member which correspond to latent images formed using the surface of the imaging member, and a transfer system configured to transfer the developed images from the surface of the imaging member to media. The arrangement further includes a contamination removal device configured to remove contamination material from the surface of the imaging member, and a control system configured to control the contamination removal device to contact the surface of the imaging member to remove the contamination material from the surface of the imaging member at a first moment in time and to space the contamination removal device from the surface of the imaging member at a second moment in time where the contamination removal device does not remove the contamination material from the surface of the imaging member.

Hard image forming apparatus and method having contamination removal

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Galil, Israel

Wael Salalha