This inventor holds 4 USPTO granted patents. Top assignee: Engelhard Corporation. Active years: 1983-1992.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1983-1992
Title: W Robert Hatfield: Innovator in Ammonia Oxidation Technology
Introduction
W Robert Hatfield is a notable inventor based in Westfield, NJ (US), recognized for his contributions to ammonia oxidation technology. He holds a total of 4 patents, showcasing his expertise and innovative spirit in the field.
Latest Patents
His latest patents include methods for low-temperature light-off of ammonia oxidation. One patent describes a method of low-temperature start-up of ammonia oxidation plants by passing hydrogen and oxygen over platinum-containing gauzes. These gauzes bear a platinum coating with a surface area exceeding about 50 cm²/g, which heats them to temperatures sufficient for catalytic oxidation of ammonia. Another patent focuses on platinum-rhodium and platinum-palladium-rhodium gauzes that also bear a high surface area coating, facilitating the initiation of ammonia oxidation.
Career Highlights
W Robert Hatfield has made significant strides in his career, particularly through his work at Engelhard Corporation. His innovative approaches have contributed to advancements in chemical processes, particularly in the field of ammonia oxidation.
Collaborations
He has collaborated with notable coworkers, including Hyo C Lee and Ronald Marshall Heck, further enhancing the impact of his work in the industry.
Conclusion
W Robert Hatfield's contributions to ammonia oxidation technology through his patents and collaborations highlight his role as a key innovator in the field. His work continues to influence advancements in chemical engineering and industrial processes.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile