Volodymyr V Vasylyev

Title: Innovations of Volodymyr V Vasylyev

Introduction

Volodymyr V Vasylyev is a notable inventor based in Kharkiv, Ukraine. He has made significant contributions to the field of plasma technology, particularly in the area of coating deposition. With a total of two patents to his name, Vasylyev's work has garnered attention for its innovative approaches and practical applications.

Latest Patents

Vasylyev's latest patents include an "Apparatus for cathodic vacuum-arc coating deposition" and a "Filtered cathodic-arc plasma source." The apparatus for cathodic vacuum-arc coating deposition features a mixing chamber with input and output ducts, plasma sources for ion flow, and solenoidal coils that create magnetic fields to steer the ion flow. This design enhances the efficiency of the coating process. The filtered cathodic-arc plasma source is designed to minimize plasma losses while maximizing output efficiency. It incorporates a right-angle bend magnetic filter and multiple magnetic coils to achieve desirable magnetic flux paths and reduce undesired particle output.

Career Highlights

Throughout his career, Vasylyev has worked with prominent organizations, including the United States of America as represented by the Secretary of the Air Force and Veeco Instruments Inc. His work in these institutions has allowed him to apply his innovative ideas in practical settings, contributing to advancements in plasma technology.

Collaborations

Vasylyev has collaborated with notable colleagues such as Ivan I Aksenov and Volodymyr Evgenievich Strelnytskiy. These collaborations have further enriched his research and development efforts in the field.

Conclusion

Volodymyr V Vasylyev's contributions to plasma technology through his patents and collaborations highlight his role as an influential inventor. His innovative approaches continue to impact the field of coating deposition and plasma sources.