Ashdod, Israel

Vladimir Ovechkin

This inventor holds 3 USPTO granted patents. Top assignee: Applied Materials Israel Limited. Active years: 2022-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vladimir Ovechkin. Retrieved from https://idiyas.com/inventor/vladimir-ovechkin

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 66.7

Average Co-Inventor Count = 8.0

ph-index = 1

Forward Citations = 1(Granted Patents)


Company Filing History:


Years Active: 2022-2026

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3 patents (USPTO):Explore Patents

Title: Innovations by Vladimir Ovechkin

Introduction

Vladimir Ovechkin is a notable inventor based in Ashdod, Israel. He has made significant contributions to the field of semiconductor technology, holding two patents that showcase his expertise and innovative spirit.

Latest Patents

Ovechkin's latest patents focus on mask inspection systems for semiconductor specimens. The first patent describes a method for detecting runtime defects on a mask during a scan. This method involves acquiring multiple sets of aerial images corresponding to various focus states and calculating statistic-based Edge Positioning Displacement (EPD) values to determine the nature of the defect. The second patent also addresses mask inspection, detailing a process for filtering potential defects based on calculated EPD values, thereby enhancing the accuracy of defect identification.

Career Highlights

Vladimir Ovechkin is currently employed at Applied Materials Israel Limited, a leading company in the semiconductor industry. His work involves developing advanced inspection systems that are crucial for maintaining the quality and reliability of semiconductor manufacturing.

Collaborations

Ovechkin collaborates with talented coworkers, including Ariel Shkalim and Evgeny Bal, who contribute to the innovative projects at Applied Materials Israel Limited.

Conclusion

Vladimir Ovechkin's contributions to semiconductor technology through his patents and work at Applied Materials Israel Limited highlight his role as a key innovator in the field. His advancements in mask inspection systems are paving the way for improved semiconductor manufacturing processes.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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