NEW YORK, NY, United States of America

Vladimir Kurs

This inventor holds 1 USPTO granted patent. Top assignee: Warby Parker Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vladimir Kurs. Retrieved from https://idiyas.com/inventor/vladimir-kurs

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 10.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Vladimir Kurs and Virtual Try-On Technology.

Introduction

Vladimir Kurs is an inventor based in New York, New York. He is associated with Warby Parker Inc. and is named on 1 patent, concerning computer vision and virtual eyewear try-on.

Latest Patents

Kurs’s patent, “Systems, Non-Transitory Computer Readable Mediums, and Methods for Spectacle Removal and Virtual Try-On,” describes a computing device that uses a camera to capture an image and identify locations corresponding to an object, such as spectacles. The system assesses those locations, removes selected portions through image inpainting, and creates an augmented image by superimposing a chosen object. The resulting image is then displayed on the device’s user interface, supporting a virtual try-on experience.

Career Highlights

Kurs’s listed invention combines image segmentation, inpainting, and augmented-image generation to help users preview an item digitally. His association with Warby Parker connects the patent to eyewear and online shopping applications.

Collaborations

Benjamin Hall and David J. DeShazer are identified as Kurs’s coworkers. The available information does not specify their roles in the patent or the development of the technology.

Conclusion

Vladimir Kurs’s patent describes a camera-based approach to removing spectacles from an image and enabling virtual try-on, reflecting an application of computer vision to eyewear shopping.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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