Sderot, Israel

Vladimir Kampel

This inventor holds 4 USPTO granted patents and 2 EPO patents. Top assignee: Eastman-Kodak Company. Active years: 2010-2012.


 

Average Co-Inventor Count = 4.1

ph-index = 2

Forward Citations = 5(Granted Patents)


Company Filing History:


Years Active: 2010-2012

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4 patents (USPTO):Explore Patents

Title: The Innovations of Vladimir Kampel: A Leader in Radiation-Sensitive Imageable Elements

Introduction

Vladimir Kampel, an innovative inventor based in Sederot, Israel, has made significant contributions to the field of radiation-sensitive imageable elements. With a remarkable portfolio of four patents, Kampel has dedicated his career to developing advanced technologies that enhance sensitivity, resolution, and solvent resistance in imaging applications. His work is pivotal in sectors such as lithographic printing and printed circuit boards.

Latest Patents

Kampel's latest patented inventions showcase his expertise in formulating effective imaging materials. One notable invention focuses on positive-working radiation-sensitive imageable elements. These elements are created using a unique water-insoluble polymeric binder that consists of vinyl acetal recurring units equipped with pendant hydroxyaryl groups. This composition results in high sensitivity and solvent resistance, ultimately facilitating the development of lithographic printing plates.

Another crucial patent by Kampel involves radiation-sensitive compositions that significantly improve the performance of imageable elements. By utilizing a binder containing at least 20 mol % of recurring units derived from hydroxyaryl carboxylic acid esters, some of which are modified with cyclic imide moieties, these innovations promise enhanced sensitivity and solvent resistance, making them ideal for applications in lithography and circuit board fabrication.

Career Highlights

Kampel's tenure at Eastman Kodak Company has solidified his reputation as a leading innovator in the imaging industry. His contributions have consistently demonstrated a commitment to pushing the boundaries of technology, particularly in the development of materials that optimize the imaging process. His patents reflect an understanding of both the technical and practical aspects of imageable elements, reinforcing his status as an influential inventor.

Collaborations

Throughout his career, Kampel has collaborated with notable professionals in the field, including Moshe Levanon and Emmanuel Lurie. These partnerships have enabled a fusion of ideas and expertise, further enhancing the quality and range of innovations emerging from their collective efforts.

Conclusion

Vladimir Kampel's work in the development of radiation-sensitive imageable elements underscores the vital role of innovation in advanced imaging technologies. His patents not only showcase his technical acumen but also contribute significantly to the ongoing progress in industries reliant on precise imaging techniques. As he continues to innovate, Kampel remains a pivotal figure in the realm of inventions that shape the future of imaging and lithography.

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