Novosibirsk, Russia

Vladimir Andreevich Kruch

This inventor holds 1 USPTO granted patent. Top assignee: Mcd Technologies S.a R.l.. Active years: 2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vladimir Andreevich Kruch. Retrieved from https://idiyas.com/inventor/vladimir-andreevich-kruch

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 7.0

ph-index = 1


Company Filing History:


Years Active: 2025

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1 patent (USPTO):Explore Patents

Title: Vladimir Andreevich Kruch: Innovator in Rubber Compounds

Introduction

Vladimir Andreevich Kruch is a notable inventor based in Novosibirsk, Russia. He has made significant contributions to the field of rubber compounds, particularly in enhancing their properties through innovative additives.

Latest Patents

Kruch holds a patent for an "Additive for rubber compounds and method for producing same." This invention focuses on additives that improve the electrical conductivity and physical and mechanical properties of rubber compounds. The additive comprises 1 to 20 wt % carbon nanotubes, 3 to 90 wt % high-viscosity organic rubber, and 8 to 95 wt % low-molecular-weight organic dispersion medium. The method for producing this additive is also outlined in the patent.

Career Highlights

Kruch is associated with Mcd Technologies S.a R.l., where he applies his expertise in developing advanced materials. His work has been instrumental in pushing the boundaries of rubber technology.

Collaborations

Some of his notable coworkers include Mikhail Rudolfovich Predtechenskiy and Alexandr Alexandrovich Khasin. Their collaboration has likely contributed to the innovative projects at Mcd Technologies.

Conclusion

Vladimir Andreevich Kruch's work in the field of rubber compounds showcases his innovative spirit and dedication to enhancing material properties. His contributions are valuable to the industry and reflect the importance of research and development in advancing technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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