Company Filing History:
2 out of 3,345 
1 out of 745 Years Active: 1989-1993
Title: The Innovative Contributions of Vivian W Ryan
Introduction
Vivian W Ryan is a notable inventor based in Nutley, NJ (US). She has made significant contributions to the field of semiconductor technology, holding a total of 3 patents. Her work primarily focuses on improving the reliability and performance of aluminum metallization in integrated circuits.
Latest Patents
Ryan's latest patents include innovative methods for aluminum metallization doped with iron and copper. This approach effectively prevents stress-induced grain boundary movement in aluminum lines used as connections in integrated circuits. By doping the aluminum with iron, not only is grain boundary movement avoided, but electromigration problems are also significantly decreased. This advancement is crucial for enhancing the durability and efficiency of semiconductor devices.
Career Highlights
Throughout her career, Vivian W Ryan has worked with prestigious organizations such as AT&T Bell Laboratories and American Telephone & Telegraph Company. Her experience in these companies has allowed her to develop and refine her innovative ideas, contributing to the advancement of technology in the telecommunications sector.
Collaborations
Ryan has collaborated with esteemed colleagues, including Ronald J Schutz and Gerald Smolinsky. These partnerships have fostered a creative environment that has led to groundbreaking developments in her field.
Conclusion
Vivian W Ryan's contributions to semiconductor technology through her patents and collaborations highlight her role as a pioneering inventor. Her work continues to influence the industry, ensuring the reliability and performance of integrated circuits.