Boise, ID, United States of America

Viswas Purohit

USPTO Granted Patents = 1 

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 38(Granted Patents)


Company Filing History:


Years Active: 2019

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1 patent (USPTO):Explore Patents

Title: Innovations of Viswas Purohit: A Pioneer in Surface Modification Technology

Introduction: Viswas Purohit, an accomplished inventor based in Boise, ID, holds a patent that showcases his innovative contributions to the field of plasma-assisted surface modification. His work focuses on enhancing etch metrics, which has significant implications for various high-tech industries.

Latest Patents: Viswas Purohit's patent, titled "Surface modification control for etch metric enhancement," presents a comprehensive method for monitoring and controlling plasma-assisted surface modification processes. This method includes the introduction of a surface modification gas into a plasma processing chamber and the ignition of plasma to initiate the surface modification process. Notably, the method enables the acquisition of optical emission spectra during the modification process, allowing for precise endpoint control by altering parameters based on the collected data. This invention reflects the cutting-edge advancements in material processing technology.

Career Highlights: Purohit is currently affiliated with Tokyo Electron Limited, a leader in semiconductor manufacturing equipment. His expertise in plasma processing and surface modification places him at the forefront of technological innovation within the industry. His single patent stands as a testament to his inventive capabilities and his commitment to advancing the field.

Collaborations: Throughout his career, Viswas Purohit has had the opportunity to collaborate with notable colleagues, including Brian J Coppa and Seiichi Watanabe. These partnerships have likely enriched his work experience and contributed to the development of innovative solutions in the semiconductor manufacturing sector.

Conclusion: Viswas Purohit's contributions to the field of surface modification technology exemplify the spirit of innovation that drives progress in today's high-tech landscape. His patented method not only enhances etch metrics but also paves the way for further advancements in plasma-assisted processes. As technology evolves, inventors like Purohit play a crucial role in shaping the future of engineering and materials science.

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