Company Filing History:
Years Active: 2013
Title: Innovations of Virendra Kumar Dwivedi
Introduction
Virendra Kumar Dwivedi is a notable inventor based in Rajasthan, India. He has made significant contributions to the field of photo lithography through his innovative work. His research focuses on developing advanced materials that enhance the efficiency and precision of lithographic processes.
Latest Patents
Dwivedi holds a patent for a novel invention titled "Diazonaphthoquinonesulfonic acid bisphenol derivative useful in photo lithographic sub micron patterning and a process for preparation thereof." This invention provides unique diazonaphthoquinonesulfonic acid bisphenol derivatives. The patent describes a photoresist coating that includes an alkali-soluble resin, a photoactive compound, and a surfactant. The resulting photoresist film is capable of achieving features smaller than one micron. The photoactive compound is designed to be soluble or swellable in aqueous alkaline solutions, specifically diazonaphthoquinonesulfonic bisphenol esters of a defined general formula. This innovation also outlines a process for coating and imaging the light-sensitive composition.
Career Highlights
Dwivedi is associated with the Council of Scientific & Industrial Research, where he has been involved in various research projects. His work has contributed to advancements in materials science and engineering, particularly in the development of photoresist materials.
Collaborations
Some of his notable coworkers include Vummadi Venkat Reddy and Vaidya Jayathirtha Rao. Their collaborative efforts have furthered research in the field of photo lithography and related technologies.
Conclusion
Virendra Kumar Dwivedi's innovative contributions to photo lithography demonstrate his expertise and commitment to advancing technology in this field. His patent reflects a significant step forward in the development of efficient materials for lithographic applications.