The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 22, 2013
Filed:
Mar. 20, 2008
Vummadi Venkat Reddy, Andhra Pradesh, IN;
Vaidya Jayathirtha Rao, Andhra Pradesh, IN;
Mannepalli Lakshmi Kantam, Andhra Pradesh, IN;
Sunkara Sakunthala Madhavendra, Andhra Pradesh, IN;
Virendra Kumar Dwivedi, Rajasthan, IN;
Vummadi Venkat Reddy, Andhra Pradesh, IN;
Vaidya Jayathirtha Rao, Andhra Pradesh, IN;
Mannepalli Lakshmi Kantam, Andhra Pradesh, IN;
Sunkara Sakunthala Madhavendra, Andhra Pradesh, IN;
Virendra Kumar Dwivedi, Rajasthan, IN;
Council of Scientific & Industrial Research, New Delhi, IN;
Abstract
The present invention provides novel diazonaphthoquinonesulfonic acid bisphenol derivatives. More particularly, the present invention relates to photo restive coating comprising alkali-soluble resin, a photoactive compound and a surfactant. The photoresist film prepared has less then one micron. The photoactive compound is soluble or swellable in aqueous alkaline solutions and is diazonaphthoquinonesulfonic bisphenol esters of the general formula (A), wherein DNQ represents a 2-Diazo-1-naphthoquinone-4-sulfonyl, 2-Diazo-1-naphthoquinone-5-sulfonyl, 1-Diazo-2-naphthoquinone-4-sulfonyl groups and R1 R1 represents an alkyl, aryl and substituted aryl groups. The invention also provides a process for coating and imaging the light-sensitive composition.