Adelaide, Australia

Violetta Shevchenko

This inventor holds 1 USPTO granted patent. Top assignee: Amazon Technologies, Inc.. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Violetta Shevchenko. Retrieved from https://idiyas.com/inventor/violetta-shevchenko

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

Average Co-Inventor Count = 1.0


Company Filing History:


Years Active: 2026

Loading Chart...
1 patent (USPTO):Explore Patents

Title: Violetta Shevchenko and Virtual Makeup Image Generation.

Introduction

Violetta Shevchenko is an inventor associated with Adelaide, Australia, and Amazon Technologies, Inc. Her patent work addresses virtual makeup application, combining image processing and appearance modeling to create realistic previews.

Latest Patents

The provided information lists one patent for Shevchenko: “Makeup Blending in Image Generation.” The invention describes systems and methods for generating an image of a person’s face virtually wearing selected makeup. It processes the input image to separate facial features such as shading, highlights, boundaries, and color. By estimating the reflectance of both the skin and the makeup, the system calculates the resulting appearance and reconstructs the face while preserving its shading and highlights. The goal is a realistic image of the person wearing the selected makeup.

Career Highlights

Shevchenko’s listed patent reflects work at the intersection of image generation, facial analysis, and virtual cosmetics. Her patent portfolio, according to the supplied data, includes 1 patent.

Collaborations

Shevchenko is associated with Amazon Technologies, Inc. The supplied information also names Hui Pang and Sunil Sharadchandra Hadap as coworkers.

Conclusion

Violetta Shevchenko’s patent on makeup blending in image generation describes a method for producing realistic virtual makeup previews by modeling facial appearance and makeup reflectance.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
Loading…