Vineeth Sasidharan

Title: Innovations of Vineeth Sasidharan

Introduction

Vineeth Sasidharan is an accomplished inventor based in Albuquerque, NM (US). He has made significant contributions to the field of nanopatterning, holding a total of 2 patents. His work focuses on advanced systems that enhance the precision and efficiency of nanopatterning techniques.

Latest Patents

Vineeth's latest patents include "Dual diffraction order spin-on-glass phase-grating beam-splitter based oblique incidence nanopatterning and methods thereof." This patent discloses a system for oblique incidence nanopatterning that utilizes a grating beam-splitter mounted on a tip-tilt adjustable mount. The system is designed to ensure that the surfaces of the grating beam-splitter and the photoresist-coated sample are substantially parallel, allowing for precise exposure using a laser. Another notable patent is "Interferometric lithography grating-mask-based wafer-scale large-area nanopatterning." This method outlines a comprehensive approach for large-area, full-wafer nanopatterning, utilizing a laser light source and advanced optics to achieve uniform exposure across a full wafer.

Career Highlights

Vineeth Sasidharan is currently associated with UNM Rainforest Innovations, where he continues to push the boundaries of nanopatterning technology. His innovative approaches have garnered attention in the research community, contributing to advancements in the field.

Collaborations

Vineeth has collaborated with notable colleagues such as Steven Roy Julien Brueck and Alexander Neumann. These partnerships have fostered a collaborative environment that enhances the development of cutting-edge technologies.

Conclusion

Vineeth Sasidharan's contributions to nanopatterning through his innovative patents and collaborations highlight his role as a leading inventor in the field. His work continues to influence advancements in technology and research.