The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 17, 2024
Filed:
Feb. 04, 2022
Applicant:
Unm Rainforest Innovations, Albuquerque, NM (US);
Inventors:
Steven R. J. Brueck, Albuquerque, NM (US);
Alexander Neumann, Albuquerque, NM (US);
Vineeth Sasidharan, Albuquerque, NM (US);
Assignee:
UNM RAINFOREST INNOVATIONS, Albuquerque, NM (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); G02B 27/10 (2006.01); G02B 27/14 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70408 (2013.01); G02B 27/1086 (2013.01); G02B 27/144 (2013.01); G03F 7/7055 (2013.01);
Abstract
According to examples of the present disclosure, a method for large-area, full-wafer nanopatterning is disclosed. The method includes providing a laser light source; providing beam conditioning and translation optics to expand the beam to illuminate a full wafer area; providing a grating beam-splitter; providing recombination optics to direct at least two beams from the grating beam splitter to a full wafer photoresist-coated target; and exposing the full wafer photoresist-coated target.