This inventor holds 1 USPTO granted patent. Top assignee: Air Products and Chemicals, Inc.. Active years: 1979.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Company Filing History:
Years Active: 1979
Title: The Innovative Contributions of Vincent T. Ciuryla
Introduction
Vincent T. Ciuryla is a notable inventor based in Stony Run, Pennsylvania. He has made significant contributions to the field of environmental technology, particularly in the area of gas scrubbing processes. His work focuses on improving methods for removing harmful substances from industrial emissions.
Latest Patents
Vincent T. Ciuryla holds a patent for the "Removal of sulfur oxides from gases by scrubbing with ammoniacal solutions." This innovative process is designed to effectively eliminate sulfur oxides from gases while preventing the formation of sub-micron liquid particles, which can lead to particulate matter emissions. His patent represents a controlled approach to environmental protection, ensuring cleaner air quality.
Career Highlights
Ciuryla is associated with Air Products and Chemicals, Inc., a leading company in the industrial gases sector. His work at the company has allowed him to apply his innovative ideas in practical settings, contributing to advancements in gas treatment technologies. His dedication to environmental sustainability is evident in his patent and ongoing projects.
Collaborations
Vincent T. Ciuryla has collaborated with Eugene J. Greskovich, a fellow professional in the field. Their partnership highlights the importance of teamwork in driving innovation and developing effective solutions for environmental challenges.
Conclusion
Vincent T. Ciuryla's contributions to the field of gas scrubbing technology demonstrate his commitment to environmental sustainability. His innovative patent reflects a significant step forward in reducing harmful emissions, showcasing the impact of dedicated inventors in creating a cleaner future.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
