Company Filing History:
Years Active: 1980-1983
Title: Innovations of Vincent J Pascarella
Introduction
Vincent J Pascarella is a notable inventor based in Erie, PA (US). He has made significant contributions to the field of polyurethanes, holding a total of five patents. His work primarily focuses on developing innovative materials that are widely used in various industries, particularly the automobile sector.
Latest Patents
One of Pascarella's latest patents involves thermoplastic polyurethanes prepared by reacting polyisocyanate. This invention describes novel polyurethanes that are especially suited for applications requiring initial heat resistance in a non-alcohol, non-exotic solvent system such as methyl ethyl ketone. These polyurethanes exhibit peel strengths of at least 5 pounds per linear inch (pli) uncrosslinked at temperatures ranging from about 180°F to about 200°F. They are typically used in the automobile industry and are substantially free of reactive isocyanate and hydroxyl groups. Another significant patent involves photoinitiation systems for free radical polymerization reactions, where acyloin urethans can be employed to effect photopolymerization of free radical-polymerizable compositions in both inert and oxygen-containing atmospheres.
Career Highlights
Pascarella's career is marked by his innovative approach to material science. His work at Lord Corporation has allowed him to explore and develop advanced polyurethane technologies. His contributions have not only enhanced product performance but have also paved the way for new applications in various industries.
Collaborations
Throughout his career, Pascarella has collaborated with notable colleagues, including John R McDowell and Dennis D Howard. These collaborations have fostered a creative environment that has led to the development of groundbreaking technologies.
Conclusion
Vincent J Pascarella's contributions to the field of polyurethanes exemplify the spirit of innovation. His patents reflect a commitment to advancing material science, particularly in applications that require high performance and reliability. His work continues to influence the industry and inspire future innovations.