Company Filing History:
Years Active: 2023
Title: Vincent J Genova: Innovator in Plasma Processing Technology
Introduction
Vincent J Genova is a notable inventor based in Ithaca, NY (US). He has made significant contributions to the field of plasma processing technology, particularly in methods for substrate treatment. His innovative approach has led to the development of a unique patent that addresses challenges in material removal processes.
Latest Patents
Vincent J Genova holds a patent titled "Method for removing re-sputtered material from patterned sidewalls." This invention provides a method for effectively removing re-sputtered material on a substrate. The process involves a chamber equipped with a plasma source and a substrate support, where a substrate with a patterned sidewall is processed using generated plasma. The sacrificial layer is removed after the substrate processing, showcasing a novel approach to enhancing substrate treatment efficiency. He has 1 patent to his name.
Career Highlights
Vincent is affiliated with Cornell University, where he has been involved in research and development in the field of plasma technology. His work has contributed to advancements in material processing techniques, making him a valuable asset to the academic and research community.
Collaborations
Vincent has collaborated with notable colleagues, including David G Lishan and Kyle Dorsey. These collaborations have fostered innovation and have led to further advancements in their respective fields.
Conclusion
Vincent J Genova's contributions to plasma processing technology exemplify the spirit of innovation in the field of material science. His patent and collaborative efforts continue to influence advancements in substrate treatment methods.