Sherbrooke, Canada

Vincent Halde

This inventor holds 1 USPTO granted patent. Top assignee: Sb Technologies, LLC. Active years: 2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vincent Halde. Retrieved from https://idiyas.com/inventor/vincent-halde

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 5.0

ph-index = 1


Company Filing History:


Years Active: 2026

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1 patent (USPTO):Explore Patents

Title: Vincent Halde: Innovator in Vectorial Magnetometry

Introduction

Vincent Halde is a notable inventor based in Sherbrooke, Canada. He has made significant contributions to the field of magnetometry, particularly with his innovative patent that enhances the understanding of spin populations in crystalline structures.

Latest Patents

Halde holds a patent for a "Vectorial magnetometer and associated method for distinguishing spin population transfer in different crystalline defect orientations." This invention allows for the distinction of relative superposed amplitudes associated with different spin populations. It utilizes known proportions of Rabi attenuation in various orientations, enabling the creation of contrast between attenuation proportions stemming from different spin populations.

Career Highlights

Vincent Halde is currently associated with Sb Technologies, LLC, where he applies his expertise in magnetometry. His work focuses on advancing technologies that leverage the unique properties of spin populations in materials.

Collaborations

Halde collaborates with talented individuals such as Guillaume Duclos-Cianci and David Roy-Guay, contributing to innovative projects and research in the field.

Conclusion

Vincent Halde's work in vectorial magnetometry represents a significant advancement in understanding spin populations, showcasing his innovative spirit and dedication to scientific progress. His contributions continue to influence the field and inspire future research.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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