Fairfield, CT, United States of America

Vincent G Krenke

This inventor holds 1 USPTO granted patent. Top assignee: Casco Products Corporation. Active years: 1989.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Vincent G Krenke. Retrieved from https://idiyas.com/inventor/vincent-g-krenke

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 4.0

ph-index = 1

Forward Citations = 21(Granted Patents)


Company Filing History:


Years Active: 1989

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1 patent (USPTO):Explore Patents

Title: Innovations of Vincent G Krenke

Introduction

Vincent G Krenke is an accomplished inventor based in Fairfield, CT (US). He is known for his innovative contributions to liquid level gauging technology. His work has significantly impacted the field, showcasing his expertise and creativity.

Latest Patents

Vincent holds a patent for a liquid level gauging apparatus. This system includes a sensor device designed for installation in the aperture of a wall of a liquid-containing vessel. The apparatus features a metal fitting with a through bore and a cylindrical body portion that can be secured in the vessel wall. It also includes a cup-like enclosure with a prism and a light source, allowing for high-resolution and accurate liquid monitoring.

Career Highlights

Vincent is associated with Casco Products Corporation, where he applies his skills in developing innovative solutions. His patent demonstrates his commitment to enhancing the reliability and accuracy of liquid level gauging systems.

Collaborations

Vincent has worked alongside notable colleagues such as Thomas Beauvais and Peter J Lupoli. Their collaborative efforts contribute to the advancement of technology in their field.

Conclusion

Vincent G Krenke's contributions to liquid level gauging technology exemplify his innovative spirit and dedication to improving industry standards. His work continues to influence the field positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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