Vincent A Christina

Title: Vincent A Christina: Innovator in Photolithography Technology

Introduction

Vincent A Christina is a notable inventor based in Shoreham, NY (US). He has made significant contributions to the field of photolithography, particularly in the production of extreme ultra-violet light. His innovative approach has implications for integrated circuit fabrication and other advanced technologies.

Latest Patents

Vincent A Christina holds 1 patent for a "Method and apparatus for adjustably supporting a light source for use in photolithography." This patent describes a method and apparatus for producing extreme ultra-violet light. It includes a nozzle for flowing gas at a supersonic velocity and a source for directing a radiated energy beam into the flowing gas. This process stimulates the emission of extreme ultra-violet light, which is suitable for photolithography applications. Additionally, a remotely-controlled XYZ micro-positioning stage facilitates the alignment of the nozzle and diffuser to the radiated energy beam.

Career Highlights

Vincent A Christina is associated with Advanced Energy Systems, Inc., where he continues to develop innovative technologies. His work has been instrumental in advancing the capabilities of photolithography, which is crucial for modern electronics manufacturing.

Collaborations

Vincent has collaborated with notable colleagues, including Edwin Gerard Haas and Richard A Hartley, Jr. These partnerships have contributed to the development of cutting-edge technologies in the field.

Conclusion

Vincent A Christina's contributions to photolithography and extreme ultra-violet light production highlight his role as an innovator in the technology sector. His work continues to influence the future of integrated circuit fabrication and related fields.