Espoo, Finland

Ville Hakala

This inventor holds 1 USPTO granted patent and 1 EPO patent. Top assignee: Sofi Filtration Oy. Active years: 2023.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ville Hakala. Retrieved from https://idiyas.com/inventor/ville-hakala

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 2.0

ph-index = 1


Company Filing History:


Years Active: 2023

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1 patent (USPTO):Explore Patents

Title: Ville Hakala - Innovator in Filtration Technology

Introduction

Ville Hakala is a notable inventor based in Espoo, Finland. He has made significant contributions to the field of filtration technology. His innovative approach has led to the development of a unique method for cleaning filter elements.

Latest Patents

Hakala holds a patent for a "Method for cleaning a filter element and a filtering device." This invention relates to a method for cleaning a filter element made of a porous material. The method involves directing ultrasound to the filter element and, after a predefined time, sending an impulse to a filtrate reservoir. This impulse forces the filtrate inside the filter element to remove particles from its surface. The pressure of the impulse is between 4 to 8 times higher than the forward pressure, and the reverse flux caused by the impulse is at least 2 to 8 times the feed flux.

Career Highlights

Ville Hakala is associated with Sofi Filtration Oy, where he applies his expertise in filtration technology. His work focuses on enhancing the efficiency and effectiveness of filtration systems.

Collaborations

Hakala collaborates with Simo Aho, contributing to advancements in their field.

Conclusion

Ville Hakala's innovative methods in filtration technology demonstrate his commitment to improving industrial processes. His patent reflects a significant advancement in the cleaning of filter elements, showcasing his role as a key inventor in this domain.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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