Company Filing History:
Years Active: 2002
Title: Viktor Melnik: Innovator in Semiconductor Technology
Introduction
Viktor Melnik is a prominent inventor based in Kyiv, Ukraine. He has made significant contributions to the field of semiconductor technology, particularly through his innovative methods of fabricating ion implanted doping layers.
Latest Patents
One of Viktor Melnik's notable patents is titled "Method of fabricating ion implanted doping layers in semiconductor materials and integrated circuits made therefrom." This patent describes a method of fabricating ion implanted doping layers in semiconductor materials by subjecting the material to ultrasonic treatment during the implantation of predetermined impurities. In an alternate embodiment, ultrasonic vibrations are generated by primary ion currents of sufficient density reflected by a piezo-electric element applied to the semiconductor material. This innovative approach enhances the efficiency and effectiveness of semiconductor fabrication.
Career Highlights
Viktor Melnik is associated with the Institut für Halbleiterphysik Frankfurt (Oder) GmbH, where he has been instrumental in advancing semiconductor research and development. His work has garnered attention for its potential applications in various electronic devices.
Collaborations
Throughout his career, Viktor has collaborated with esteemed colleagues such as Dietmar Krueger and Rainer Kurps. These collaborations have further enriched his research and contributed to the advancement of semiconductor technologies.
Conclusion
Viktor Melnik's contributions to semiconductor technology through his innovative patent and collaborative efforts highlight his role as a key figure in the field. His work continues to influence advancements in electronic materials and devices.